Microwave plasma chemical vapor deposition system for high quality poly-, mono- and nanocrystalline diamond films.

Microwave plasma system ARDIS 100 is designed for chemical vapor deposition of poly-, mono- and nanocrystalline diamond films. Carbon nanotubes and nanowires can also be produced.

Chemical Vapor Deposition method allows synthesizing high purity diamond films with earlier unachievable dimensions possessing unique optical, mechanical, electronic and thermal properties.

TECHNICAL SPECIFICATIONS

• MW power 600-6000 kWt, fr. 2.45 Ghz
• Number of feed gas channels 4 the system allows adjusting gas flow from 0.3 to 60 l/hr
• Gas process pressure 30-150 Torr
• Gas mixtures primary Н2/СН4, Н2/СН4/О2, Ar/H2/CH4 doping N2, B
• Sample diameter (typical) 75 mm
• Substrate temperature up to 1200 °C
• Growth rate up to 6 µmicron/hour
• Visual control 5 quartz windows
• Chamber water-cooled vacuum stainless steel chamber
• Operation Windows compatible CCDSys control software allows operation during up to 1000 hours without any interactions from the operator.
• Dimension 1850(l)/1100(w)/1755(h) mm

APPLICATIONS
Electronics

• Heat sinks for semiconductor lasers, microelectronics;
• Acoustoelectronics;
• MEMS;
• Detectors for ionizing radiation;
• MW Field Effected Transistor;

Optics

• Windows for high power IR lasers;
• Windows for optical devices working in corrosive mediums;
• Raman lasers

MW Instruments

• Windows for extra-high-power gyrotrons and klystrons;
  Structural elements non-absorptive to radiation;

Tools

• Diamond coated or based on diamond films

Medicine, Ecology

• Biosensors;
• Biocompatible coatings;
• Corrosion resistant electrodes for water cleaning electrolysis (doping diamond)